您現在位置：首頁>產品中心>Logitech精密材料表面處理>化學機械研磨拋光>CMP Tribo臺式化學機械研磨拋光設備
 |
臺式化學機械研磨拋光設備
- 瀏覽次數：4279
- 更新時間：2023-04-11
產品簡介：
CMP Tribo 臺式化學機械研磨拋光設備,The Tribo CMP system is a precision engineered, bench top solution designed with one thing in mind - the research of wafer processes, including their associated wafer, pad and slurry interactions.
CMP Tribo 臺式化學機械研磨拋光設備簡介：
The Tribo CMP system is a precision engineered, bench top solution designed with one thing in mind - the research of wafer processes, including their associated wafer, pad and slurry interactions. Primary application areas for the Tribo system are in the field of CMP planarization or delayering,
with secondary applications in the field of Tribological science and research.
CMP Tribo 臺式化學機械研磨拋光設備特點：
Ø Superior real time analytical capabilities
Ø Consistent, repeatable performance
Ø Enhanced control at your fingertips
Ø Adaptable and portable - Logitech quality as standard
上一個:DP系列封閉式精密拋光系統 下一個:CMP Orbis柜式化學機械研磨拋光設備
